The North America Atomic Layer Deposition (ALD) Market would witness market growth of 12.1% CAGR during the forecast period (2017 ? 2023). Atomic Layer Deposition (ALD) is among the superior forms of deposition methods which are used to produce thin and conformal films. The technology is used in the fabrication of semiconductor devices, and is also a part of the set of tools available for the synthesis of nano-technology materials. Concerns over global warming and climate change have compelled the world governments to look towards renewable & green energy sources. The subsidies have encouraged the use of solar power in industries. Thin film materials offer miniaturization and are one of the reasons for MEMS to increasingly utilize micro components.
Based on Product, the market report segments the market into Aluminium Oxide ALD, Metal ALD, Plasma Enhanced ALD, Catalytic ALD, and Others. Based on End User, the North America Atomic Layer Deposition (ALD) market segments the market into Aluminium Oxide ALD, Metal ALD, Plasma Enhanced ALD, Catalytic ALD, and Others. Based on Countries, the North America Atomic Layer Deposition (ALD) market segments the market into US, Mexico, Canada, and Rest of North America.
The market research report covers the analysis of key stake holders of the North America Atomic Layer Deposition (ALD) Market. Key companies profiled in the report include Adeka Corporation, Aixtron SE, Applied Materials, Inc., ASM International NV, Lam Research Corporation, Tokyo Electron Limited, Denton Vacuum, Kurt J. Lesker Company, Beneq Oy, and Veeco Instruments.
Related Reports:
Global Atomic Layer Deposition (ALD) Market
Europe Atomic Layer Deposition (ALD) Market
Asia Pacific Atomic Layer Deposition (ALD) Market
LAMEA Atomic Layer Deposition (ALD) Market
Our team of dedicated experts can provide you with attractive expansion opportunities for your business.