According to a new report, published by KBV research, The Global Extreme Ultraviolet Lithography (EUVL) Systems Market size is expected to reach $23.05 billion by 2028, rising at a market growth of 21.3% CAGR during the forecast period.
The Light Source segment acquired maximum revenue share in the Global Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment in 2021 thereby, achieving a market value of $10.6 billion by 2028. The growth of the segment is owing to the fact that they are the most crucial part of EUVL systems. Light moves through a succession of peaks and troughs, much like ocean waves. A wavelength is a distance between the peaks. The smaller the microchip components that can be produced by lithography, the shorter the wavelength of light.
The Asia Pacific market dominated the Global Extreme Ultraviolet Lithography (EUVL) Systems Market by Region in 2021, and would continue to be a dominant market till 2028; thereby, achieving a market value of $8.7 billion by 2028. The North America market is experiencing a CAGR of 20.6% during (2022 - 2028). Additionally, The Europe market would showcase a CAGR of 20.8% during (2022 - 2028).
Full Report: https://www.kbvresearch.com/extreme-ultraviolet-lithography-systems-market/
The market research report has exhaustive quantitative insights providing a clear picture of the market potential in various segments across the globe with country wise analysis in each discussed region. The key impacting factors of the market have been discussed in the report with the elaborated company profiles of Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).
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